Transparent conductive ZnO thin films prepared by plasma enhanced CVD

Authors
Ishiyama, K Shimizu, M Tanaka, Z Kondo, K
Citation
K. Ishiyama et al., Transparent conductive ZnO thin films prepared by plasma enhanced CVD, KAG KOG RON, 25(3), 1999, pp. 485-487
Citations number
13
Categorie Soggetti
Chemical Engineering
Journal title
KAGAKU KOGAKU RONBUNSHU
ISSN journal
0386216X → ACNP
Volume
25
Issue
3
Year of publication
1999
Pages
485 - 487
Database
ISI
SICI code
0386-216X(199905)25:3<485:TCZTFP>2.0.ZU;2-D
Abstract
Zinc oxide film is a promising material for the transparent electrode and c olor development laser in the ultra violet region. This zinc oxide film has been prepared from DEZ and oxygen with plasma CVD without doping. The depo sited film shows c-axis orientation with more than 300 degrees C of substra te temperature. The film grows from a triangular pyramidal shape to hexagon al plate shape crystals. The minimum resistance is found to be 4.55 x 10(-3 ) Omega . cm.