Structure and properties of carbon nitride films deposited by magnetron sputtering

Carbon nitride films are deposited using de magnetron sputtering in N-2 dis charge. The structure, electrical resistance, optical band gap, and mechani cal properties of the films are characterized. Cls near edge X-ray absorpti on fine structure (NEXAFS) spectra show that the intensity of pi* resonance is the lowest for the film grown at substrate temperature (T-s) of 350 deg rees C. Both electrical resistance and optical band gap decrease with a ris e in T-s, while the hardness for the carbon nitride films has its maximum a t T-s = 350 degrees C. The correlation between the structure and properties of the films is discussed. (C) 1999 Elsevier Science S.A. All rights reser ved.