Dimer length variation for different reconstructions of Si, Ge, and mixed Si-Ge dimers on Si(001) and Ge(001) substrates

Citation
Sca. Gay et Gp. Srivastava, Dimer length variation for different reconstructions of Si, Ge, and mixed Si-Ge dimers on Si(001) and Ge(001) substrates, PHYS REV B, 60(3), 1999, pp. 1488-1491
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
3
Year of publication
1999
Pages
1488 - 1491
Database
ISI
SICI code
0163-1829(19990715)60:3<1488:DLVFDR>2.0.ZU;2-V
Abstract
We report on ab initio pseudopotential calculations for geometrictiucture o f Ge, Si, and mixed Si-Ge dimers on the Si(001)-(1 x 2), Si(001)-(2 x 2), G e(001)-(1);(2), and Ge(001)-(2 x 2) surfaces. Our studies show that there i s a clear energy gain in going from the (1 x 2) reconstruction to a semiant iphase (2 x 2) reconstruction for all of these systems. However, for the ab ove reconstruction change, significant elongation is found to take place fo r the pure Ge-Ge and mixed Si-Ge dimers, but not for the pure Si-Si dimers despite similar beneficial change in substrate relaxation. [S0163-1829(99)0 2427-3].