It is shown, on the basis of the IR spectra, that introducing HCl into elec
trolyte (water-ethanol solution of HF, intended for the anodic formation of
porous silicon) leads to variations in the chemical composition of the sur
face of produced layers. It is discovered that the oxygen content in silico
n-hydrogen surface compounds decreases, which leads to an increase in hydro
phobicity and a decrease in the rate of natural oxidation of silicon by wat
er molecules present in the environment. It is assumed that chloride ions t
ake part in the electrochemical dissolution of silicon. The assumption is c
onfirmed by variations in the polarization dependences and by the decrease
in the effective charge spent for transferring silicon atoms from the cryst
al lattice into solution.