Using scanning tunneling microscopy, we have studied the temperature depend
ent decay of multilayer Cu islands on Cu(lll). We focus on the normal diffu
sion limited decay of small islands on top of large islands where no rapid
decay events occur. Using a numerical integration of the analytical express
ion for diffusion limited decay, we determine the step edge barrier as a fu
nction of temperature. The additional activation barrier for mass transport
across the step edge is found to be 0.22 eV. (C) 1999 Elsevier Science B.V
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