The sensitivity of metal-insulator-semiconductor structure gas sensors base
d on silicon or silicon carbide to different fluorine-containing gases was
studied in the temperature range 20-530 degrees C. Silicon based gas sensor
s could be used for the determination of fluorine and hydrogen fluoride at
room temperature. The sensitivity to fluorine is 28.0+/-0.5 mV/lg(p(F-2)),
the sensitivity to HF is 44.4+/-1.6 mV/(p(HF)), and the detection is about
10 ppb in both instances. High temperature silicon carbide sensors can be a
pplied for the determination of fluorine and fluorocarbons (CF3CH2F, CF3CCl
3, CF3CH2Cl, CHClF2, CCl2F2, CCl3F) up to 530 degrees C. The sensor signal
for fluorocarbon concentration measurements demonstrates a Nernstian concen
tration dependence. The detection limit for these gases is ca. 10 ppm. (C)
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