Real-time observation of ellipsometry oscillation during GaAs layer by layer growth by metalorganic vapor-phase epitaxy

Citation
Js. Lee et al., Real-time observation of ellipsometry oscillation during GaAs layer by layer growth by metalorganic vapor-phase epitaxy, JPN J A P 2, 38(6AB), 1999, pp. L614-L616
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
6AB
Year of publication
1999
Pages
L614 - L616
Database
ISI
SICI code
Abstract
Ellipsometry oscillations during GaAs metalorganic vapor-phase epitaxy on G aAs (001) substrates were observed. The ellipsometric signal was found to o scillate at a period corresponding to 1 monolayer of GaAs growth. Excellent agreement was seen between growth rate data from oscillation period and th ose from thickness measurements after growth (deviation: <1%). Oscillation clearly depends on growth temperature and source gas material. The results suggest that ellipsometry oscillation originates from the absorption of pro be light by Ga-alkyl bonds at the edges of 2-dimensional islands.