Sputter deposition of cerium yttrium iron garnet films on substrates with ion-beam bombarded patterns

Citation
Y. Okamura et S. Yamamoto, Sputter deposition of cerium yttrium iron garnet films on substrates with ion-beam bombarded patterns, JPN J A P 2, 38(6AB), 1999, pp. L636-L638
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
6AB
Year of publication
1999
Pages
L636 - L638
Database
ISI
SICI code
Abstract
We report the experimental results of magnetooptic rare-earth iron-garnet s puttered film deposition on-substrates with a modified surface. The magneto optic garnet considered here is cerium-substituted yttrium iron garnet whic h is one of the promising materials for nonreciprocal optical devices and m agnetooptic recording media. The surface of the substrate, gadolinium galli um garnet, is etched by ion-beam bombardment, whose energy was controllable from 0.2 keV to I keV. By varying the ion-beam energy, the deposited films can be in either the crystalline or the amorphous state and the quality of grown crystalline films can be improved. The results obtained are explaine d in terms of the surface morphology of substrates.