M. Yeadon et al., SURFACE-MORPHOLOGY AND OPTICAL CHARACTERIZATION OF GAN GROWN ON ALPHA-AL2O3(0001) BY RADIO-FREQUENCY-ASSISTED MOLECULAR-BEAM EPITAXY, Applied physics letters, 70(22), 1997, pp. 3023-3025
Wurtzitic GaN epilayers have been grown on sapphire (0001) substrates
by radio-frequency atomic nitrogen plasma-assisted molecular beam epit
axy. Atomic force microscopy, reflectivity, and photoluminescence meas
urements have been performed in order to investigate the influence of
in situ and ex situ annealing on the surface morphology and optical pr
operties. We demonstrate a significant improvement in both the structu
ral and optical quality of our GaN epilayers using in situ annealed lo
w-temperature-deposited GaN buffer layers. (C) 1997 American Institute
of Physics.