Anisotropy in metallic thin films patterned by the atomic saw method

Citation
H. Jaffres et al., Anisotropy in metallic thin films patterned by the atomic saw method, J MAGN MAGN, 203, 1999, pp. 132-134
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN journal
03048853 → ACNP
Volume
203
Year of publication
1999
Pages
132 - 134
Database
ISI
SICI code
0304-8853(199908)203:<132:AIMTFP>2.0.ZU;2-L
Abstract
The use of atomic saw method applied to thin metallic epitaxial systems wit h in-plane magnetization has allowed us to exhibit strong magnetic anisotro py. The structuration of thin 40 Angstrom Co thin films into 0.5 mu m large stripes have induced a uniaxial anisotropy held whose direction and magnit ude 500 Oe is consistent with shape energy consideration. On the other hand , the same structuration applied to 20 Angstrom Fe thin films have induced a uniaxial magnetic anisotropy explained by the observation of a uniaxial r elaxation of the strain held after process. EXAFS experiments has permitted to quantify this lattice relaxation which is seen to distort the initial B CC Fe cell uniaxially inducing strong magnetoelastic effects. (C) 1999 EIse vier Science B.V. All rights reserved.