Through-mask electrochemical micromachining of titanium

Citation
C. Madore et al., Through-mask electrochemical micromachining of titanium, J ELCHEM SO, 146(7), 1999, pp. 2526-2532
Citations number
27
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
146
Issue
7
Year of publication
1999
Pages
2526 - 2532
Database
ISI
SICI code
0013-4651(199907)146:7<2526:TEMOT>2.0.ZU;2-3
Abstract
Through-mask electrochemical micromachining has been employed to fabricate well-defined three-dimensional topographies in titanium. Well-controlled sh apes with a smooth surface finish were obtained using optimized electrolyte composition and electrochemical parameters. The shape change resulting fro m electrochemical etching through patterned photoresists were numerically s imulated using the boundary element method, assuming the rate of titanium d issolution to be diffusion controlled. A satisfactory agreement was found b etween experimentally measured and simulated etched profiles. (C) 1999 The Electrochemical Society. S0013-4651(98)10-076-9. All rights reserved.