Through-mask electrochemical micromachining has been employed to fabricate
well-defined three-dimensional topographies in titanium. Well-controlled sh
apes with a smooth surface finish were obtained using optimized electrolyte
composition and electrochemical parameters. The shape change resulting fro
m electrochemical etching through patterned photoresists were numerically s
imulated using the boundary element method, assuming the rate of titanium d
issolution to be diffusion controlled. A satisfactory agreement was found b
etween experimentally measured and simulated etched profiles. (C) 1999 The
Electrochemical Society. S0013-4651(98)10-076-9. All rights reserved.