Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmask

In this article, we present a;new method for fabricating precisely defined nanometer scale photoresist wire patterns. The Langmuir technique was utili zed to form high aspect ratio lamellae, or wire patterns, of Ag nanocrystal s at the air/water interface, and these patterns were transferred onto resi st-coated substrates as a Langmuir-Schaeffer film and as a shadowmask. The wire patterns were transferred to the photoresist material by spatially sel ective electron beam exposure on the Ag nanocrystal wire shadowmask. Monte Carlo simulation was done to estimate the electron stopping power for the A g nanocrystal shadowmask at low voltage. (C) 1999 American Vacuum Society. [S0734-2101(99)20104-2].