Studies of ion bombardment in high density plasmas containing CF4

Authors
Olthoff, JK Wang, YC
Citation
Jk. Olthoff et Yc. Wang, Studies of ion bombardment in high density plasmas containing CF4, J VAC SCI A, 17(4), 1999, pp. 1552-1555
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
4
Year of publication
1999
Part
1
Pages
1552 - 1555
Database
ISI
SICI code
0734-2101(199907/08)17:4<1552:SOIBIH>2.0.ZU;2-I
Abstract
We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively cou pled Gaseous Electronics Conference radio-frequency reference cell for disc harges generated in pure CF4, and in CF4:Ar and CF4:O-2:Ar mixtures. Abunda nt ionic species, including secondary ions such as CO+ and COF+, were obser ved and their implications are discussed. [S0734-2101(99)03204-2].