Scanning tunneling microscopy and spectroscopy of tungsten oxide thin films in air

Citation
S. Santucci et al., Scanning tunneling microscopy and spectroscopy of tungsten oxide thin films in air, J VAC SCI A, 17(4), 1999, pp. 1639-1646
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
4
Year of publication
1999
Part
1
Pages
1639 - 1646
Database
ISI
SICI code
0734-2101(199907/08)17:4<1639:STMASO>2.0.ZU;2-6
Abstract
Scanning tunneling spectroscopy and microscopy investigations have been car ried out in air on thermally evaporated tungsten oxide thin films deposited onto silicon substrates. The films have been submitted to thermal annealin g at different temperatures and for different times. The microscopy images show strong effects of recrystallization and different grain sizes dependin g on the thermal treatment. The spectroscopic data exhibit a rectifying cha racteristics and the comparison between the topographic and current images allows a better understanding of the sample morphology in relation to the e lectrical behavior. X-ray photoelectron spectroscopy valence band measureme nts have evidenced a structure near the Fermi level, which has been assigne d to a structural oxygen deficiency of the deposited films, which is also o bserved in the conductance curve of some samples. (C) 1999 American Vacuum Society. [S0734-2101(99)05204-5].