Electromigration induced dynamics of surface dislocations and atomic steps

Citation
N. Shimoni et al., Electromigration induced dynamics of surface dislocations and atomic steps, J VAC SCI A, 17(4), 1999, pp. 1693-1695
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
4
Year of publication
1999
Part
1
Pages
1693 - 1695
Database
ISI
SICI code
0734-2101(199907/08)17:4<1693:EIDOSD>2.0.ZU;2-4
Abstract
Electromigration induced dynamics of surface dislocations in flame annealed gold films is studied using scanning tunneling microscopy. The emergence o f new dislocations appears to be strongly correlated with the onset of curr ent stressing, and their direction is correlated with that of the current. The emergence rate decreases with time elapsed from flame annealing. We als o investigate the time evolution of dislocations, which, in most cases, are found to be more robust against electromigration as compared to the normal atomic steps. (C) 1999 American Vacuum Society. [S0734-2101(99)00304-8].