The single phase of TlCu-1234 superconductor thin films is prepared for the
first time by the amorphous phase epitaxy (APE) method, which is thallium
treatment of sputtered amorphous phase at 900 degrees C for 1 h. The amorph
ous phase is prepared by sputtering from the stoichiometric target composit
ion CuBa2Ca3Cu4O12-y. The films on the SrTiO3 substrate are aligned biaxial
ly after the thallium treatment. Highly reproducible TlCu-1234 films are pr
epared by this method. The XRD reflected a predominant single phase with th
e c-axis lattice constant of 18.74 Angstrom. This lattice constant value is
in between that of Cu-1234 (17.99 Angstrom) and T1-1234 (19.11 degrees). T
he pole figure measurements of (103) reflection of the films showed a-axis-
oriented crystals with Delta phi = 0.8 degrees. The composition of the film
s after Energy Dispersive X-ray (EDX) measurements is Tl0.8Cu0.2Ba2Ca3Cu4O1
2-y. From the resistivity measurements, the T-c is 113 K. Preliminary J(c)
measurements showed a current density of 1.0 X 10(6) A/cm(2) (77 K, 0 T). (
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