Surface structure of GaN(0001) in the chemical vapor deposition environment

Citation
A. Munkholm et al., Surface structure of GaN(0001) in the chemical vapor deposition environment, PHYS REV L, 83(4), 1999, pp. 741-744
Citations number
27
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
83
Issue
4
Year of publication
1999
Pages
741 - 744
Database
ISI
SICI code
0031-9007(19990726)83:4<741:SSOGIT>2.0.ZU;2-O
Abstract
We report the first observation of the atomic-scale structure of the GaN(00 01) surface in the metalorganic chemical vapor deposition environment. Meas urements were performed using in situ grazing-incidence x-ray scattering. W e determined the surface equilibrium phase diagram as a function of tempera ture and ammonia partial pressure, which contains two phases with 1 X 1 and (root 3 X 2 root 3)R30 degrees symmetries. The (root 5 X 2 root 5)R30 degr ees phase is found to have a novel "missing row" structure with 1/3 of the surface Ga atoms absent.