Production and annealing of electron irradiation damage in ZnO

Citation
Dc. Look et al., Production and annealing of electron irradiation damage in ZnO, APPL PHYS L, 75(6), 1999, pp. 811-813
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
6
Year of publication
1999
Pages
811 - 813
Database
ISI
SICI code
0003-6951(19990809)75:6<811:PAAOEI>2.0.ZU;2-J
Abstract
High-energy (> 1.6 MeV) electrons create acceptors and donors in single-cry stal ZnO. Greater damage is observed for irradiation in the [0001] directio n (Zn face) than in the [000 (1) over bar] direction (O face). The major an nealing stage occurs at about 300-325 degrees C, and is much sharper for de fects produced by Zn-face irradiation, than for those resulting from O-face irradiation. The defects appear to have a chain character, rather than bei ng simple, near-neighbor vacancy/interstitial Frenkel pairs. These experime nts suggest that ZnO is significantly more "radiation hard" than Si, GaAs, or GaN, and should be useful for applications in high-irradiation environme nts, such as electronics in space satellites. (C) 1999 American Institute o f Physics. [S0003-6951(99)04232-1].