Rp. Meagley et al., Unique polymers via radical diene cyclization: polyspironorbornanes and their application to 193 nm microlithography, CHEM COMMUN, (16), 1999, pp. 1587-1588
The design of novel alkylated norcamphor derivatives that undergo cyclopoly
merization is explored; the resulting polymers incorporate suitable functio
nal groups for chemical amplification and show excellent imaging characteri
stics under lithographic exposure at 193 nm.