Recent developments in ferroelectric films have been made in terms of their
application in nonvolatile memories and dynamic random access memories. On
e highlight is the report of a complete description of the temperature-depe
ndent dielectric behavior of (Ba,Sr)TiO3 films as a function of strain, com
position, and thickness. For the first time, a direct link has been made be
tween the thin film and bulk electrical properties.