The lattice location of specific fission products (Cs and I) in zirconia si
ngle crystals was investigated by using Rutherford backscattering and chann
eling experiments. The fission products were introduced into the ZrO2 matri
x up to a concentration of a few at.% by ion implantation. The ZrO2 single
crystals are strongly damaged during the implantation process, and the dama
ge creation is almost the same for Cs or I ion implantation. The location o
f the implanted fission products inside the host matrix depends on the natu
re of the impurity. A significant substitutional fraction is observed in th
e case of Cs ions at low concentration, whereas I ions mainly occupy random
sites. These different site occupancies are likely correlated to specific
impurity-defect interactions or phase formation which can affect the transp
ort mechanisms of fission products in the confinement matrix.