Mechanisms for formation of inorganic byproducts in plasma chemical processing of hazardous air pollutants

Citation
S. Futamura et al., Mechanisms for formation of inorganic byproducts in plasma chemical processing of hazardous air pollutants, IEEE IND AP, 35(4), 1999, pp. 760-766
Citations number
10
Categorie Soggetti
Engineering Management /General
Journal title
IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS
ISSN journal
00939994 → ACNP
Volume
35
Issue
4
Year of publication
1999
Pages
760 - 766
Database
ISI
SICI code
0093-9994(199907/08)35:4<760:MFFOIB>2.0.ZU;2-O
Abstract
Plasma chemical behavior of hazardous air pollutants (HAP's) (Cl2C=CCl2, Cl 2C=CHCl, Cl3C-CH3, Cl2CH-CH2Cl, CH3Cl, CH3Br, and benzene), their molecular probes (CH4 CH3-CH3, and CH2=CH2), and carbon oxides (COx) was investigate d with a ferroelectric packed-bed plasma reactor to obtain information on t he formation of COx and N2O. It has been shown that the oxidation of CO to CO2 is a slow reaction in plasma, and that CO and CO2 mainly result from di fferent precursors. Simultaneous achievement of complete oxidative decompos ition of HAP's in plasma and recovery of CO as a chemical feedstock could b e favorable. The process of N2O formation is affected by HAP structures and oxygen concentration. In the decomposition of olefinic HAP's, such as Cl2C =CCl2 and Cl2C=CHCl, high-power short-residence-time operations are effecti ve in suppressing N2O formation. In the cases of CH3Cl and CH3Br, low speci fic energy density operations could be necessary to reduce NaO concentratio ns. The yields and selectivities of CO, CO2, and N2O change drastically by adding only 2% of oxygen to N-2, and oxygen concentration is not a good fac tor to control these inorganic oxides.