Effects of etching time and thickness on the performance of the microstripline resonator of YBa2Cu3Ox thin films

Citation
Jw. Choi et al., Effects of etching time and thickness on the performance of the microstripline resonator of YBa2Cu3Ox thin films, JPN J A P 1, 38(4A), 1999, pp. 1941-1944
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
4A
Year of publication
1999
Pages
1941 - 1944
Database
ISI
SICI code
Abstract
Microstrip transmission lines in the form of an open-ended half-wavelength resonator were fabricated by depositing YBa2Cu3Ox, thin films on MgO substr ates using the pulsed laser deposition method. All YBa2Cu3Ox thin films had c-axis orientation. The effects of etching time and thickness on the perfo rmance of the microstrip line resonator were investigated. As the etching t ime increased, the loaded quality factor decreased and the surface resistan ce increased due to the undercut and the increase in roughness of the etche d surface. The quality factor and the surface resistance showed a strong de pendence on the film thickness. The superconducting properties and the micr owave characteristics correlated well with the microstructure.