Effects of phase change in the recording layer due to temperature changes a
nd ihs material parameters used in the simulated transient temperature dist
ributions were examined. The initial structure of the recording layer was t
he key parameter for simu lated temperature distributions in both the erasi
ng and writing processes. Latent heat due to the phase change had little ef
fect on the transient temperature distributions, however, the temperature-d
ependent heat capacity had significant effects and resulted in a transient
temperature distribution level lower than that using a constant room-temper
ature capacity value. From the simulated transient temperature profile, coo
ling rate, dependence of phase-changed spot size on the laser power and las
er pulse duration, as well as the phase-change characteristics in the phase
-change optical disk, could be obtained. By applying proper material parame
ters, the disk with a hydrogenated amorphous carbon film as the top dielect
ric layer with a disk structure of PC/ZnS-SiO2 (111 nm)/GeSbTe(20 nm)/alpha
-C:H (63 nm)/Al(70 nm) showed less temperature variation between the center
and the edge of the irradiated spot than that of a disk with a conventiona
l disk structure of PC:ZnS-SiO2(144 nm)/GeSbTe (20 nm)/ZnS-SiO2(21 nm)/Al(7
0 nm). Less temperature variation may give rise to a written spot with more
uniform microstructures.