Analysis of device characteristics for InGaN semiconductor lasers

Citation
G. Hatakoshi et al., Analysis of device characteristics for InGaN semiconductor lasers, JPN J A P 1, 38(3B), 1999, pp. 1780-1785
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
38
Issue
3B
Year of publication
1999
Pages
1780 - 1785
Database
ISI
SICI code
Abstract
Carrier overflow and perpendicular transverse mode in InGaN multi-quantum-w ell lasers have been analyzed by numerical calculation. A high acceptor con centration for the p-type cladding layer and the reduction of the active la yer volume have a large effect on the reduction of carrier overflow. Anti-g uide-like behavior of the waveguide mode is formed in InGaN laser structure s where the cladding layers have insufficient thickness. The layer structur e should be designed so ns to reduce the carrier overflow and suppress the anti-guide-like mode.