Structural analysis of a carbon nitride film prepared by ion-beam-assisteddeposition

The microstructure of a carbon nitride (CNx) film formed by ion-beam-assist ed deposition (IBAD) was investigated by transmission electron microscopy ( TEM). This film was formed on the Si (100) substrate by IBAD with an N/C tr ansport ratio of 1. Three different spacings (0.34 nm, 0.21 nm, 0.12 nm) we re observed by transmission electron diffraction (TED) and the periodic str ucture corresponding to the spacing of 0.34 nm was aligned perpendicular to the substrate. The bending of this plane resembled a carbon nanotube; ther efore, it seemed reasonable to suppose that the CNx film obtained consisted of numerous carbon-nanotube-like structural elements grown vertically: rel ative to the substrate, and it also seemed appropriate that these structura l elements should be termed nanotube-like carbon nitride.