Optimum growth parameters for type-II infrared lasers

Citation
Mj. Yang et al., Optimum growth parameters for type-II infrared lasers, J APPL PHYS, 86(4), 1999, pp. 1796-1799
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
4
Year of publication
1999
Pages
1796 - 1799
Database
ISI
SICI code
0021-8979(19990815)86:4<1796:OGPFTI>2.0.ZU;2-O
Abstract
The surface, structural, and optical properties of InAs/InGaSb/AlSb mid-inf rared lasers grown by molecular beam epitaxy have been systematically studi ed, respectively, by Nomarski differential interference contrast, high-reso lution x-ray diffraction, and variable-temperature photoluminescence. It is found that the optimum growth temperature is between 400 and 450 degrees C , based on the calibrated transmission thermometry. In addition, the impact of interfacial bond type and Sb sources has been investigated. A 5.91 mu m laser, grown with the optimal growth parameters, exhibits a maximum cw ope rating temperature of 210 K. (C) 1999 American Institute of Physics. [S0021 -8979(99)08716-2].