Resonance enhancement of electronic Raman scattering from nitrogen defect levels in silicon carbide

Citation
Jc. Burton et al., Resonance enhancement of electronic Raman scattering from nitrogen defect levels in silicon carbide, J APPL PHYS, 86(4), 1999, pp. 2073-2077
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
4
Year of publication
1999
Pages
2073 - 2077
Database
ISI
SICI code
0021-8979(19990815)86:4<2073:REOERS>2.0.ZU;2-G
Abstract
Electronic Raman scattering from nitrogen defect levels in SiC is seen to b e significantly enhanced with excitation by red (633 nm, 1.98 eV) or near-I R (785 nm, 1.58 eV) laser light at room temperature. Four nitrogen peaks ar e observed in 6H-SiC (380, 430, 510, and 638 cm(-1)) and three peaks in 4H- SiC (about 400, 530, and 570 cm(-1)). The peaks in the 4H-SiC spectrum are seen to shift to lower frequency with increasing nominal doping concentrati on. Raman spectra taken at low temperature in 6H-SiC reveal differences bet ween wafers and Lely grown platelets by the appearance of several additiona l peaks. The origin of the resonant enhancement is the near-IR absorption b and associated with the green color characteristic of n-type SiC. These res ults demonstrate that the laser wavelength is a key parameter in the charac terization of SiC by Raman scattering. (C) 1999 American Institute of Physi cs. [S0021-8979(99)03016-9].