Charge trapping and charge compensation during Auger electron spectroscopyon SiO2

Citation
Hs. Guo et al., Charge trapping and charge compensation during Auger electron spectroscopyon SiO2, J APPL PHYS, 86(4), 1999, pp. 2337-2341
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
4
Year of publication
1999
Pages
2337 - 2341
Database
ISI
SICI code
0021-8979(19990815)86:4<2337:CTACCD>2.0.ZU;2-Y
Abstract
It is well known that radiolysis, induced by the electron bombardment, lead s to different defects in SiO2, but little is known about the trapping beha vior of these defects. In this article, the charging behavior and the depth profiles of the irradiation damage introduced by electron bombardment are studied with Auger electron spectroscopy (AES). For charge reduction an env ironmental AES using O-2 (up to 8 x 10(-8) Torr) and specimen heating are a pplied. In environmental AES, a strong charge reduction is observed, and th e importance of the environment for charge compensation reveals a correlati on with electron stimulated desorption. By heating the sample, a strong cha rge reduction takes place above 500 degrees C; complete charge compensation can be expected by heating the sample above 700 degrees C in an O-2 enviro nment of 5 x 10(-8) Torr. We suggest that E-' centers, nonbridging oxygen h ole centers, and peroxy radicals, are responsible for the efficient trappin g of electrons. The observed discharging is believed to be related to the a nnealing of the defects. (C) 1999 American Institute of Physics. [S0021-897 9(99)01016-3].