M. Griebel et al., Single electron transport in resonant tunnelling diodes laterally confinedby ion implantation, J PHYS D, 32(14), 1999, pp. 1729-1733
In order to investigate single electron transport the lateral dimensions of
a resonant tunnelling diode have been confined to the submicrometre range
by oxygen ion implantation. Depending on the temperature sequence used in t
he annealing step subsequent to the implantation, these small area resonant
tunnelling diodes in the single electron regime either show clearly develo
ped staircase-like features asa consequence of single electron tunnelling t
hrough discrete zero-dimensional states or a sequence of current peaks due
to single electron tunnelling through coupled zero-dimensional states. Magn
etotransport measurements suggest impurity states related to implantation d
efects as an origin of the zero-dimensional states.