Single electron transport in resonant tunnelling diodes laterally confinedby ion implantation

Citation
M. Griebel et al., Single electron transport in resonant tunnelling diodes laterally confinedby ion implantation, J PHYS D, 32(14), 1999, pp. 1729-1733
Citations number
33
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
32
Issue
14
Year of publication
1999
Pages
1729 - 1733
Database
ISI
SICI code
0022-3727(19990721)32:14<1729:SETIRT>2.0.ZU;2-R
Abstract
In order to investigate single electron transport the lateral dimensions of a resonant tunnelling diode have been confined to the submicrometre range by oxygen ion implantation. Depending on the temperature sequence used in t he annealing step subsequent to the implantation, these small area resonant tunnelling diodes in the single electron regime either show clearly develo ped staircase-like features asa consequence of single electron tunnelling t hrough discrete zero-dimensional states or a sequence of current peaks due to single electron tunnelling through coupled zero-dimensional states. Magn etotransport measurements suggest impurity states related to implantation d efects as an origin of the zero-dimensional states.