T. Mizoguchi et al., Theoretical calculation of oxygen K electron-energy-loss near-edge structures of Si-doped MgO, J PHYS-COND, 11(29), 1999, pp. 5661-5670
Maximum solubility of Si in MgO has been reported to be 9.0 at.%. The local
environment of the Si solute is of great interest. In order to foresee the
difference of the O K-edge electron-energy-loss near-edge structure (ELNES
) or x-ray absorption near-edge structure (XANES) due to the presence of th
e Si solute, first-principles molecular orbital calculations are performed
using model clusters composed of 27 and 125 atoms that include a core hole.
Extra peaks are found in the theoretical O K-edge photoabsorption cross se
ction (PACS) of the Si-doped cluster. Their positions are found to depend s
trongly on the Si-O bond length. A realistic model cluster for the Si-doped
MgO is constructed by total energy minimization using interatomic potentia
ls. An Mg vacancy is included to keep the charge neutrality. The extra feat
ure in the O Kedge PACS due to the presence of Si is then expected to be lo
cated mainly at the higher-energy shoulder of the main peak of the undoped
MgO.