Preparation of thick films by electrophoretic deposition using surface modified silica particles derived from sol-gel method

Citation
K. Hasegawa et al., Preparation of thick films by electrophoretic deposition using surface modified silica particles derived from sol-gel method, J SOL-GEL S, 15(3), 1999, pp. 243-249
Citations number
13
Categorie Soggetti
Material Science & Engineering
Journal title
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
ISSN journal
09280707 → ACNP
Volume
15
Issue
3
Year of publication
1999
Pages
243 - 249
Database
ISI
SICI code
0928-0707(199909)15:3<243:POTFBE>2.0.ZU;2-P
Abstract
Thick films were prepared by the electrophoretic sol-gel deposition of orga nically modified, sub-micron silica particles. The silica particles were mo dified with 3-aminopropyltriethoxysilane (APS) and vinyltriethoxysilane (VT ES). Smooth and crack-free films ca. 15 mu m thick were obtained when APS m odified silica particles were used for the cathodic electrophoretic deposit ion. Thick films with decreased open spaces among particles were obtained w hen silica particles modified with VTES were co-deposited with an organic p olymer, polyethylene maleate.