Jw. Kim et al., Characterization of the absorption edges of epitaxial AlGaN grown by plasma-induced molecular beam epitaxy, J KOR PHYS, 35, 1999, pp. S279-S282
The dependence of the absorption edge of wurtzite AlxGa(1-x)N on the AIN mo
le fraction was studied. The Al mole fraction was varied from 0 to 1. The a
bsorption coefficient at room temperature was determined by transmission an
d photothermal deflection spectroscopy. Photothermal deflection spectroscop
y can be applied to determine the low absorbance values. With those results
, the effective bandgaps of the AlxGa1-xN alloys were defined as the photon
energy E-4.8 at an absorption coefficient of 10(4.8) cm(-1). From the ener
gy position of the absorption edge versus AIN mole fraction, a bowing param
eter of 1.3 eV could be determined. The bowing parameter agreed quite well
with the measured effective bandgaps of AlGaN alloys.