Semiconductor-metal phase transition in VO2 films synthesized on alpha-Al2O3 by oxygen-reactive deposition using a neodymium-doped yttrium aluminium garnet laser

Citation
Pr. Zhu et al., Semiconductor-metal phase transition in VO2 films synthesized on alpha-Al2O3 by oxygen-reactive deposition using a neodymium-doped yttrium aluminium garnet laser, PHIL MAG L, 79(8), 1999, pp. 603-608
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE LETTERS
ISSN journal
09500839 → ACNP
Volume
79
Issue
8
Year of publication
1999
Pages
603 - 608
Database
ISI
SICI code
0950-0839(199908)79:8<603:SPTIVF>2.0.ZU;2-H
Abstract
Good-crystal-quality VO2 films have been synthesized on alpha-Al2O3 using a laser ablation technique. The epitaxial relationship between the film and substrate was examined with X-ray diffraction and Rutherford back-scatterin g spectroscopy-channelling techniques, and a systematic coherent stacking o f atoms twin formation found. As a function of temperature, the films under go a phase transition from a semiconductor to a metal at around 63 degrees C. The electrical resistance changes by 10(4) to 10(5) with a hysteresis wi dth of about 1 degrees C, and the optical transmission changes from 0.82 to 0.05 for 3.4 mu m infrared light.