Semiconductor-metal phase transition in VO2 films synthesized on alpha-Al2O3 by oxygen-reactive deposition using a neodymium-doped yttrium aluminium garnet laser
Pr. Zhu et al., Semiconductor-metal phase transition in VO2 films synthesized on alpha-Al2O3 by oxygen-reactive deposition using a neodymium-doped yttrium aluminium garnet laser, PHIL MAG L, 79(8), 1999, pp. 603-608
Good-crystal-quality VO2 films have been synthesized on alpha-Al2O3 using a
laser ablation technique. The epitaxial relationship between the film and
substrate was examined with X-ray diffraction and Rutherford back-scatterin
g spectroscopy-channelling techniques, and a systematic coherent stacking o
f atoms twin formation found. As a function of temperature, the films under
go a phase transition from a semiconductor to a metal at around 63 degrees
C. The electrical resistance changes by 10(4) to 10(5) with a hysteresis wi
dth of about 1 degrees C, and the optical transmission changes from 0.82 to
0.05 for 3.4 mu m infrared light.