Sulfur: A donor dopant for n-type diamond semiconductors

Citation
I. Sakaguchi et al., Sulfur: A donor dopant for n-type diamond semiconductors, PHYS REV B, 60(4), 1999, pp. R2139-R2141
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
4
Year of publication
1999
Pages
R2139 - R2141
Database
ISI
SICI code
0163-1829(19990715)60:4<R2139:SADDFN>2.0.ZU;2-M
Abstract
Evidence for the donor nature of sulfur in diamond was obtained by introduc ing hydrogen sulfide into the microwave assisted plasma chemical vapor depo sition process. The sulfur was successfully doped into homoepitaxial diamon d (100) films, which exhibit n-type conduction by Hall-effect measurements in the temperature range of 250-550 K. The mobility of electrons at room te mperature was 597 cm(2) V-1 s(-1). The ionization energy of 0.38 eV was det ermined by measuring the carrier concentration as a function of temperature . [S0163-1829(99)50828-X].