Tight-binding molecular-dynamics study of amorphous carbon deposits over silicon surfaces

Citation
Cc. Fu et M. Weissmann, Tight-binding molecular-dynamics study of amorphous carbon deposits over silicon surfaces, PHYS REV B, 60(4), 1999, pp. 2762-2770
Citations number
41
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
60
Issue
4
Year of publication
1999
Pages
2762 - 2770
Database
ISI
SICI code
0163-1829(19990715)60:4<2762:TMSOAC>2.0.ZU;2-2
Abstract
We report in this paper a procedure to simulate the deposit of carbon diamo ndlike films over the Si(001) surface. We use the method of tight-binding m olecular dynamics and well-known transferable C-C and Si-Si interactions. W e propose for the Si-C interaction a weighted average of the single element interactions and test it by studying crystalline SiC, the molecule SiC, so me small mixed clusters and the surfaces of beta SiC(001). Results of the d eposition simulation for low carbon concentrations are presented, showing t he formation of a thin mixed interface layer, and its structural and some e lectronic properties are described. [S0163-1829(99)08627-0].