Vacuum arc plasma transport through a magnetic duct with a biased electrode at the outer wall

Citation
T. Zhang et al., Vacuum arc plasma transport through a magnetic duct with a biased electrode at the outer wall, REV SCI INS, 70(8), 1999, pp. 3329-3331
Citations number
16
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
REVIEW OF SCIENTIFIC INSTRUMENTS
ISSN journal
00346748 → ACNP
Volume
70
Issue
8
Year of publication
1999
Pages
3329 - 3331
Database
ISI
SICI code
0034-6748(199908)70:8<3329:VAPTTA>2.0.ZU;2-J
Abstract
Metal plasma formed by a vacuum arc plasma source can be passed through a t oroidal-section magnetic duct for the filtering of macroparticles from the plasma stream. In order to maximize the plasma transport efficiency of the filter the duct wall should be biased, typically to a positive voltage of a bout 10-20 V. In some cases it is not convenient to bias the duct, for exam ple if the duct wall is part of the grounded vacuum system. However, a posi tively biased electrode inserted into the duct along its outer major circum ference can serve a similar purpose. In this article, we describe our resul ts confirming and quantifying this effect. We also show the parametric depe ndence of the duct transport on the experimental variables. (C) 1999 Americ an Institute of Physics. [S0034-6748(99)01008-4].