We have investigated an n-type field effect transistor based on a GaAs/AlGa
As structure with a channel which consists of two tunnel-coupled quantum we
lls. Modulation of channel conductivity is achieved through a change in ele
ctron mobility under the effect of anticrossing of quantization levels in w
ells while the concentration of carriers remains practically constant. With
proper choice of the structural layout and doping profile, the transistor
can be effectively controlled by the front gate only. The possibility of ob
taining the highest amplitude of conductivity modulation by electron mobili
ty suppression in one of the quantum wells and by varying tunnel coupling b
etween the wells is investigated by numerical simulations. It is shown that
. with a gradual decrease of electron mobility in one of the quantum wells,
the conductivity modulation amplitude first increases, comes to a maximum,
and then decreases due to suppression of tunnel coupling between wells by
scattering of longitudinal momentum. The drain current dependence on the ga
te voltage of the device under investigation shows two maxima; this feature
allows the same device to be used as both an n- and p-type transistor.