Ma. Brook et al., The photolytic and hydrolytic lability of sisyl (Si(SiMe3)(3)) ethers, an alcohol protecting group, TETRAHEDRON, 55(33), 1999, pp. 10027-10040
The tris(trimethylsilyl)silyl (sisyl) group is a photolabile protecting gro
up for primary and secondary alcohols. Sisyl (tris(trimethylsilyl)silyl) et
hers 2b-11b of a number of primary and secondary alcohols 2a-11a were prepa
red in yields ranging from 70-97%. The resulting silyl ethers were stable t
o aqueous bases, Grignard reagents and Wittig reagents as would be expected
for bulky alkoxysilanes. They were also stable to selected fluoride salts
including CsF. The sisyl ethers could be cleaved using photolysis at 254 nm
in under 30 minutes to give the starting alcohols in yields ranging from 6
2-95%. The photolytic behaviour of sisyl ethers was examined in more detail
using 2,3-dimethyl-1,3-butadiene as a silylene trap. The regiochemistry of
the oligosilane fragmentation to silylenes was shown to be dependent upon
the alkoxy group. The hydrolytic stability of three sisyl ethers was compar
ed with the analogous t-butyldimethylsilyl ethers. The relative stability o
f the two silyl groups can be altered by choice of solvent: in acetic acid/
water the ease of hydrolysis followed the order ROSi(SiMe3)(3) > ROSiMe(2)t
-Bu; the inverse order was observed in CDCl3 using p-TsOH . H2O. Pseudo-fir
st-order rate constants for the acidic hydrolysis of primary, benzylic, and
secondary sisyl ethers in AcOH/THF/H2O were determined to be 3.74 x 10(-2)
s(-1), 1.94 x 10(-2) s(-1), and 1.30 x 10(-2) s(-1), respectively. The ana
logous rate constants for the TBS ethers were determined to be 6.04 x 10(-3
) s(-1), 3.53 x 10(-3) s(-1), and 3.49 x 10(-3) s(-1), respectively. (C) 19
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