Step decoration during deposition of Co on Ag(001) by ultralow energy ion beams

Citation
J. Dekoster et al., Step decoration during deposition of Co on Ag(001) by ultralow energy ion beams, APPL PHYS L, 75(7), 1999, pp. 938-940
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
7
Year of publication
1999
Pages
938 - 940
Database
ISI
SICI code
0003-6951(19990816)75:7<938:SDDDOC>2.0.ZU;2-1
Abstract
A possibility for decorating atomic steps on single-crystal surfaces by usi ng ultralow energy ion beams is reported. Isotopically pure ion beams are p roduced by a mass separator and subsequently decelerated by an electrostati c lens. The lens was designed to allow sweeping of the ion beam in order to obtain a uniform deposition over a large area. The preferred sites of sing le Co atoms on Ag are investigated with in situ scanning tunneling microsco py measurements. A clear indication is found that by increasing the energy of the deposited Co to several electron volts, an enhanced Co decoration of the Ag steps is induced. This technology opens perspectives for an increas ing number of elements which can form self-organized nanostructures such as atomic wires on vicinal crystal surfaces. (C) 1999 American Institute of P hysics. [S0003-6951(99)03533-0].