Low-voltage 0.1 mu m organic transistors and complementary inverter circuits fabricated with a low-cost form of near-field photolithography

This letter describes the combined use of a form of near-field photolithogr aphy that relies on a conformable phase masks with microcontact printing an d shadow masking for low-cost fabrication of organic transistors and simple complementary inverter circuits with critical dimensions of similar to 0.1 mu m. The good performance of the devices and their low-voltage operation make them and the fabrication procedures potentially attractive for many ap plications. (C) 1999 American Institute of Physics. [S0003-6951(99)00833-5] .