Enhancement of electrical and structural properties of GaN layers grown onvicinal-cut, a-plane sapphire substrates

Citation
M. Fatemi et al., Enhancement of electrical and structural properties of GaN layers grown onvicinal-cut, a-plane sapphire substrates, APPL PHYS L, 73(5), 1999, pp. 608-610
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
73
Issue
5
Year of publication
1999
Pages
608 - 610
Database
ISI
SICI code
0003-6951(19990803)73:5<608:EOEASP>2.0.ZU;2-A
Abstract
We report the observation of significant enhancement in the electrical and crystalline properties of GaN layers grown on vicinally cut, a-plane sapphi re substrates. Room-temperature Hall mobility and x-ray rocking curve data show a nearly twofold improvement, independent of the processing conditions , for layers grown on substrates having vicinal angles of 1.5 degrees compa red to on-axis substrates. Transmission electron microscopy shows reduced e dge dislocation density and better alignment of the grains in layers grown on vicinally cut substrates. Preliminary photoluminescence measurements als o indicate pronounced differences in the yellow band spectra between the on -axis and off-axis cut substrates. These findings contrast the relatively m odest improvements observed in layers grown on c-plane substrates with vici nal angles as high as 10 degrees. [S0003-6951(98)00831-6].