This paper proposes an automated post-sawing inspection system (APSIS) for
detecting defects on the wafer. The defect detection includes sawing defect
s and pad defects. By adopting the reference method, some features extracte
d from the reference image are used to compare with an inspecting image. Th
e experiment results showed that the recognition rate of sawing defect and
pad defect was 99.0% and 98.0%, respectively. The average processing time f
or an 8-in. wafer approximated 75 min. An on-line implementation of the sys
tem was proposed to reduce the processing time to less than half an hour. (
C) 1999 Published by Elsevier Science B.V. All rights reserved.