Molecular beam mass spectrometry studies of the gas-phase chemistry occurring during microwave plasma assisted chemical vapour deposition of diamond

Citation
Sm. Leeds et al., Molecular beam mass spectrometry studies of the gas-phase chemistry occurring during microwave plasma assisted chemical vapour deposition of diamond, DIAM RELAT, 8(8-9), 1999, pp. 1377-1382
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
8
Issue
8-9
Year of publication
1999
Pages
1377 - 1382
Database
ISI
SICI code
0925-9635(199908)8:8-9<1377:MBMSSO>2.0.ZU;2-V
Abstract
A molecular beam mass spectrometer has been used for in-situ studies of the gas-phase composition during microwave plasma chemical vapour deposition o f diamond, in a way that decouples the gas-phase reactions from those occur ring near the substrate surface. The system has been used to examine the plasma composition for a variety of hydrocarbon precursor-in-H, feedstock gas mixtures. Stable hydrocarbon spe cies, and the methyl radical signal, were recorded and calibrated to give m ole fractions of all the carbon-containing species present at detectable le vels. The plasma composition has been studied with varying chemical vapour deposition process parameters such as applied microwave power, and concentr ation of hydrocarbon in the feed gas. Molecular beam mass spectrometry has also been used to determine the plasma gas temperature, yielding results in good agreement with non-invasive methods. (C) 1999 Elsevier Science S.A. A ll rights reserved.