Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties

A low-pressure r.f. supersonic plasma jet reactor (RPJ) has been used for d eposition of Cu3N thin films. From a comparison of experimental values of c omposition weight per cent with the theoretically predicted values, it foll ows that if the r.f. power absorbed in the reactor does not exceed 75 W, st oichiometric Cu3N films can be obtained. The typical value of the depositio n growth rate was found to be in the order of 16 nm min(-1) for r.f. power P(w)approximate to 40 W. The optical energy gap, E-g, microhardness, H, and Young's modulus, E, of the deposited Cu3N thin films increase with decreas ing r.f. power. They are E-g = 1.24 eV, H = 8.8 GPa and E = 146 GPa for the sample deposited with a r.f. power of 40 W. Deposition of Cu3N thin films by means of the modificated RPJ reactor (with a multi-jet system) on to int ernal walls of cavities, holes and on the surface of complex shapes of holl ow substrates can be useful for surface-treatment technology. (C) 1999 Else vier Science S.A. All rights reserved.