Through-mold electrodeposition using the uniform injection cell (UIC): Workpiece and pattern scale uniformity

Citation
Sd. Leith et Dt. Schwartz, Through-mold electrodeposition using the uniform injection cell (UIC): Workpiece and pattern scale uniformity, ELECTR ACT, 44(23), 1999, pp. 4017-4027
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
44
Issue
23
Year of publication
1999
Pages
4017 - 4027
Database
ISI
SICI code
0013-4686(1999)44:23<4017:TEUTUI>2.0.ZU;2-R
Abstract
We report on the operation of an electroplating device based on the uniform injection cell (UIC) concept. Workpiece scale mass transfer characteristic s are explored using limiting current measurements and are related to theor etical predictions. Results show that the device delivers predictable and c ontrolled average mass transfer rates at the workpiece length scale. Patter n scale uniformity is explored by electrodeposition of NiFe microgears on t o a patterned substrate. Statistical analysis of compositional differences between an electroplated NiFe film and electrodeposited NiFe microgears is used to explore mass transfer on the pattern scale, Results illustrate that the presence of a patterned mold influences the average mass transfer rate compared to the unpatterned electrode, but does not create additional vari ability in electrolyte mixing across the substrate, Implications for using the device in through-mold plating are discussed and future improvements to the device are suggested. (C) 1999 Elsevier Science Ltd, All rights reserv ed.