Characterization of NbN/AlN/NbN tunnel junctions

Citation
Z. Wang et al., Characterization of NbN/AlN/NbN tunnel junctions, IEEE APPL S, 9(2), 1999, pp. 3259-3262
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
9
Issue
2
Year of publication
1999
Part
3
Pages
3259 - 3262
Database
ISI
SICI code
1051-8223(199906)9:2<3259:CONTJ>2.0.ZU;2-X
Abstract
We report on tunneling properties and interface structures for high-quality NbN/AlN/NbN tunnel junctions fabricated on ambient temperature MgO substra tes, Junction quality and electrical parameters were systematically investi gated in a very wide range for current density. The junctions show a very g ood junction quality with a high gap voltage, large I,RN product, and large R-sg/R-N ratio as the current density varied from 100 A/cm(2) to above 100 kA/cm(2). The average barrier heights of the NbN/AlN/NbN tunnel junctions are calculated from the barrier thickness dependence of the critical curren t density. We found that the current density has two distinct types of depe ndency on the AIN barrier thickness, corresponding to two average barrier h eights in different regions for the current density.