Bench scale evaluation of batch mode dip-coating of sol-gel LaAlO3 buffer material

Citation
A. Sheth et al., Bench scale evaluation of batch mode dip-coating of sol-gel LaAlO3 buffer material, IEEE APPL S, 9(2), 1999, pp. 1514-1518
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
9
Issue
2
Year of publication
1999
Part
2
Pages
1514 - 1518
Database
ISI
SICI code
1051-8223(199906)9:2<1514:BSEOBM>2.0.ZU;2-#
Abstract
In a joint program between the University of Tennessee Spare Institute (UTS I) and Oak Ridge National Laboratory (ORNL), thin films of lanthanum alumin ate (LAO) were formed on (100) strontium titanate (STO) single crystals and on biaxially textured nickel by dip coating from sol-gel precursors and th en annealing. XRD texture measurements were used to evaluate coating parame ters including substrate withdrawal speed, degree of hydrolysis, and therma l processing temperature, duration, and atmosphere. LAO films on the order of 1000 thick showed 100% biaxial epitaxy on STO single crystals but only a bout 50% in-plane epitaxy on nickel. An increase in substrate withdrawal ve locity resulted in thicker films. On STO film texture degraded with increas ed film thickness, but on nickel this effect was not noted, being obscured as a result of the rather poor and variable texture of the nickel substrate used. LAO on STO texture was improved by increases, within the ranges inve stigated, in the degree of hydrolysis, and in the thermal processing time, temperature, and oxygen concentration. No impediments to production scaleup were found.