Surface resistance of Bi-2212 films fabricated by multitarget sputtering

Citation
J. Otsuka et al., Surface resistance of Bi-2212 films fabricated by multitarget sputtering, IEEE APPL S, 9(2), 1999, pp. 2183-2186
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
9
Issue
2
Year of publication
1999
Part
2
Pages
2183 - 2186
Database
ISI
SICI code
1051-8223(199906)9:2<2183:SROBFF>2.0.ZU;2-C
Abstract
We investigated the surface resistance of Bi-2212 films fabricated by the m ultitarget sputtering method. The surface resistance was not dependent on t he product of the grain size and the critical current density, although man y high temperature superconductors such as Y-Ba-Cu-O agree with such a weak -link model. Therefore, it is possible that the conduction losses are relat ively low at grain boundaries in Bi-Sr-Ca-Cu-O. On the other hand, it was f ound that the intergrowth of Bi-2212 with Bi-2201 or Bi-2223 influenced the surface resistance badly. This is very interesting, although it has never been clarified as to why the surface resistance is dependent on the intergr owth. Further study will be required in order to interpret the behavior of the surface resistance of BSCCO.