An enhanced on-wafer millimeter-wave noise parameter measurement system

Citation
P. Beland et al., An enhanced on-wafer millimeter-wave noise parameter measurement system, IEEE INSTR, 48(4), 1999, pp. 825-829
Citations number
18
Categorie Soggetti
Instrumentation & Measurement
Journal title
IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT
ISSN journal
00189456 → ACNP
Volume
48
Issue
4
Year of publication
1999
Pages
825 - 829
Database
ISI
SICI code
0018-9456(199908)48:4<825:AEOMNP>2.0.ZU;2-O
Abstract
A novel on-wafer resistive noise source, useful for noise characterization of microwave devices with the cold noise power measurement technique, is de scribed. The noise source enhances measurement accuracy by providing a cali brated noise temperature directly at the device reference plane. A procedur e for determining the excess noise ratio of the noise source is presented a nd validated up to 40 GHz. The noise source is employed in an on-wafer meas urement system, allowing the noise parameters of two-port devices to be ext racted. Following a description of the apparatus and measurement procedure, an example, of a high-electron-mobility transistor noise parameter measure ment at millimeter-wave frequencies is presented.